Structural, Optical and Electrochromic Property of WO3: MoO3 Thin Film Prepared by RF Magnetron Sputtering Technique
Vyomesh R. Buch and
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Vyomesh R. Buch: Mechanical Engineering Department, Assistant Professor, BITS Edu Campus, Babaria Institute of Technology, Varnama, India.
Dongmei Dong: Postdoc Researcher, Moncton University, Shippagan Campus, New Brunswick, Canada.
Journal of Asian Scientific Research, 2019, vol. 9, issue 7, 65-70
Tungsten oxide (WO3) films have been deposited on glass substrates by RF magnetron sputtering method for different MoO3 concentration. During experiment consternation of MoO3 was varied from 5%, 10% and 15%. We examined the effect of various MoO3 concentration on structural, optical and electrochromic properties of WO3 films. To study, crystal structure and other properties XRD analysis carried out, and we found that the deposited films shows amorphous feature. The optical properties were examined using UV?Visible spectrophotometer using wavelength range 300-900 nm. From the transmittance spectra we found that as the concentration of MoO3 increases the band gap and transmittance value decreases. The electrochromic properties were examined using three electrode electrochemical cell and the potential applied between ?2.2 V. After studying electrochromic property we observed that WO3:MoO3 the films have good coloration and bleaching properties and the maximum value for coloration efficiency was 2.303 mm2/C for 15% MoO3 concentration.
Keywords: RF magnetron sputtering; Structural property; Tungsten oxide; Coloration efficiency; Electrochromic property. (search for similar items in EconPapers)
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