Temperature Effect of Nano-Structure Rebuilding on Removal of DWS mc-Si Marks by Ag/Cu MACE Process and Solar Cell
Tian Pu,
Honglie Shen,
Chaofan Zheng,
Yajun Xu,
Ye Jiang,
Quntao Tang,
Wangyang Yang,
Chunbao Rui and
Yufang Li
Additional contact information
Tian Pu: Collage of Material Science & Technology, Jiangsu Key Laboratory of Materials and Technology for Energy Conversion, Nanjing University of Aeronautics and Astronautics, Nanjing 210000, China
Honglie Shen: Collage of Material Science & Technology, Jiangsu Key Laboratory of Materials and Technology for Energy Conversion, Nanjing University of Aeronautics and Astronautics, Nanjing 210000, China
Chaofan Zheng: Collage of Material Science & Technology, Jiangsu Key Laboratory of Materials and Technology for Energy Conversion, Nanjing University of Aeronautics and Astronautics, Nanjing 210000, China
Yajun Xu: Collage of Material Science & Technology, Jiangsu Key Laboratory of Materials and Technology for Energy Conversion, Nanjing University of Aeronautics and Astronautics, Nanjing 210000, China
Ye Jiang: Collage of Material Science & Technology, Jiangsu Key Laboratory of Materials and Technology for Energy Conversion, Nanjing University of Aeronautics and Astronautics, Nanjing 210000, China
Quntao Tang: Collage of Material Science & Technology, Jiangsu Key Laboratory of Materials and Technology for Energy Conversion, Nanjing University of Aeronautics and Astronautics, Nanjing 210000, China
Wangyang Yang: Collage of Material Science & Technology, Jiangsu Key Laboratory of Materials and Technology for Energy Conversion, Nanjing University of Aeronautics and Astronautics, Nanjing 210000, China
Chunbao Rui: Phono Solar Technology Co. Ltd., Nanjing 210000, China
Yufang Li: Collage of Material Science & Technology, Jiangsu Key Laboratory of Materials and Technology for Energy Conversion, Nanjing University of Aeronautics and Astronautics, Nanjing 210000, China
Energies, 2020, vol. 13, issue 18, 1-7
Abstract:
The absence of an effective texturing technique for diamond-wire sawn multi-crystalline silicon (DWS mc-Si) solar cells has hindered commercial upgrading from traditional multi-wire slurry sawn silicon (MWSS mc-Si) solar cells. In this work, we present a novel method for the removal of diamond-wire-sawn marks in a multi-crystalline silicon wafer based on metal assisted chemical etching process with Cu/Ag dual elements and nano-structure rebuilding (NSR) treatment to make a uniform inverted pyramid textured structure. The temperature effect of NSR solution was systematically analyzed. It was found that the size of the inverted pyramid structure and the reflectance became larger with the increase of the NSR treatment temperature. Furthermore, the prepared unique inverted pyramid structure not only benefited light trapping, but also effectively removed the saw-marks of the wafer at the same time. The highest efficiency of 19.77% was obtained in solar cells with an inverted pyramid structure (edge length of 600 nm) fabricated by NSR treatment at 50 °C for 360 s, while its average reflectance was 16.50% at a 400–900 nm wavelength range.
Keywords: solar cells; metal assisted chemical etching; inverted pyramid structure; removal of saw marks (search for similar items in EconPapers)
JEL-codes: Q Q0 Q4 Q40 Q41 Q42 Q43 Q47 Q48 Q49 (search for similar items in EconPapers)
Date: 2020
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