Optimal Design of High-Frequency Induction Heating Apparatus for Wafer Cleaning Equipment Using Superheated Steam

Sang Min Park, Eunsu Jang, Joon Sung Park, Jin-Hong Kim, Jun-Hyuk Choi and Byoung Kuk Lee
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Sang Min Park: Intelligent Mechatronics Research Center, Korea Electronics Technology Institute (KETI), Bucheon 14502, Korea
Eunsu Jang: Department of Electrical and Computer Engineering, Sungkyunkwan University (SKKU), Suwon 16419, Korea
Joon Sung Park: Intelligent Mechatronics Research Center, Korea Electronics Technology Institute (KETI), Bucheon 14502, Korea
Jin-Hong Kim: Intelligent Mechatronics Research Center, Korea Electronics Technology Institute (KETI), Bucheon 14502, Korea
Jun-Hyuk Choi: Intelligent Mechatronics Research Center, Korea Electronics Technology Institute (KETI), Bucheon 14502, Korea
Byoung Kuk Lee: Department of Electrical and Computer Engineering, Sungkyunkwan University (SKKU), Suwon 16419, Korea

Energies, 2020, vol. 13, issue 23, 1-16

Abstract: In this study, wafer cleaning equipment was designed and fabricated using the induction heating (IH) method and a short-time superheated steam (SHS) generation process. To prevent problems arising from the presence of particulate matter in the fluid flow region, pure grade 2 titanium (Ti) R50400 was used in the wafer cleaning equipment for heating objects via induction. The Ti load was designed and manufactured with a specific shape, along with the resonant network, to efficiently generate high-temperature steam by increasing the residence time of the fluid in the heating object. The IH performance of various shapes of heating objects made of Ti was analyzed and the results were compared. In addition, the heat capacity required to generate SHS was mathematically calculated and analyzed. The SHS heating performance was verified by conducting experiments using the designed 2.2 kW wafer cleaning equipment. The performance of the proposed pure Ti-based SHS generation system was found to be satisfactory, and SHS with a temperature higher than 200 °C was generated within 10 s using this system.

Keywords: induction heating (IH); superheated steam (SHS); LCL resonant network; cleaning equipment; titanium (Ti); high frequency; wafer cleaning (search for similar items in EconPapers)
JEL-codes: Q Q0 Q4 Q40 Q41 Q42 Q43 Q47 Q48 Q49 (search for similar items in EconPapers)
Date: 2020
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