Design of a Chamfered Structure on Consequent-Pole Vernier Permanent-Magnet Machine

Jien Ma, Bowen Xu, Qiyi Wu, Chao Luo, Qiu Lin () and Youtong Fang
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Jien Ma: College of Electrical Engineering, Zhejiang University, Hangzhou 310027, China
Bowen Xu: College of Electrical Engineering, Zhejiang University, Hangzhou 310027, China
Qiyi Wu: College of Electrical Engineering, Zhejiang University, Hangzhou 310027, China
Chao Luo: College of Electrical Engineering, Zhejiang University, Hangzhou 310027, China
Qiu Lin: College of Electrical Engineering, Zhejiang University, Hangzhou 310027, China
Youtong Fang: College of Electrical Engineering, Zhejiang University, Hangzhou 310027, China

Energies, 2022, vol. 15, issue 20, 1-9

Abstract: The consequent-pole (CP) Vernier permanent-magnet (VPM) machine has been developed over the last decade. In VPM machine, the CP structure can produce considerable torque with a half volumn of the PMs compared with the regular structure, so the cost is reduced and the mechanical strength is increased. In this paper, an improvement of chamfering structure on a CPVPM machine is proposed to alleviate the flux leakage and increase the torque density. The chamfered structure is easily machined and will not influence the robustness of the rotor. The comparison results show that under the same volume and copper loss constraint, the proposed structure has smaller cogging torque, smaller torque ripple, larger torque density and larger power factor.

Keywords: consequent-pole; permanent-magnet machine; Vernier machine (search for similar items in EconPapers)
JEL-codes: Q Q0 Q4 Q40 Q41 Q42 Q43 Q47 Q48 Q49 (search for similar items in EconPapers)
Date: 2022
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