Recent Progress in Heat and Mass Transfer Modeling for Chemical Vapor Deposition Processes

Łukasz Łach and Dmytro Svyetlichnyy ()
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Łukasz Łach: AGH University of Krakow, Faculty of Metals Engineering and Industrial Computer Science, al. Mickiewicza 30, 30-059 Krakow, Poland
Dmytro Svyetlichnyy: AGH University of Krakow, Faculty of Metals Engineering and Industrial Computer Science, al. Mickiewicza 30, 30-059 Krakow, Poland

Energies, 2024, vol. 17, issue 13, 1-60

Abstract: Chemical vapor deposition (CVD) is a vital process for deposit of thin films of various materials with precise control over the thickness, composition, and properties. Understanding the mechanisms of heat and mass transfer during CVD is essential for optimizing process parameters and ensuring high-quality film deposition. This review provides an overview of recent advancements in heat and mass transfer modeling for chemical vapor deposition processes. It explores innovative modeling techniques, recent research findings, emerging applications, and challenges in the field. Additionally, it discusses future directions and potential areas for further advancement in CVD modeling.

Keywords: CVD; chemical vapor deposition; heat transfer; mass transfer; surface engineering; modeling (search for similar items in EconPapers)
JEL-codes: Q Q0 Q4 Q40 Q41 Q42 Q43 Q47 Q48 Q49 (search for similar items in EconPapers)
Date: 2024
References: View references in EconPapers View complete reference list from CitEc
Citations: View citations in EconPapers (1)

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