Review of MEMS metrology solutions

James F. Nichols, Meghan Shilling and Thomas R. Kurfess

International Journal of Manufacturing Technology and Management, 2008, vol. 13, issue 2/3/4, 344-359

Abstract: This paper serves as a review of current solutions for MEMS metrology. This survey provides an extensive and in-depth review of the current tools and their fundamental limitations. Techniques that are reviewed include tools that are extensions of semiconductor tools, scaled down versions of conventional metrology tools and entirely novel methods for MEMS inspection.

Keywords: MEMS metrology; microfabrication; SEM; scanning electron microscopy; interferometry; micro-CMMs; coordinate measuring machines; microelectromechanical systems; microengineering; MEMS inspection. (search for similar items in EconPapers)
Date: 2008
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Persistent link: https://EconPapers.repec.org/RePEc:ids:ijmtma:v:13:y:2008:i:2/3/4:p:344-359

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