Cascaded collimator for atomic beams traveling in planar silicon devices

Chao Li, Xiao Chai, Bochao Wei, Jeremy Yang, Anosh Daruwalla, Farrokh Ayazi and C. Raman ()
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Chao Li: Georgia Institute of Technology
Xiao Chai: Georgia Institute of Technology
Bochao Wei: Georgia Institute of Technology
Jeremy Yang: Georgia Institute of Technology
Anosh Daruwalla: Georgia Institute of Technology
Farrokh Ayazi: Georgia Institute of Technology
C. Raman: Georgia Institute of Technology

Nature Communications, 2019, vol. 10, issue 1, 1-8

Abstract: Abstract Micro- and increasingly, nano-fabrication have enabled the miniaturization of atomic devices, from vapor cells to atom chips for Bose-Einstein condensation. Here we present microfabricated planar devices for thermal atomic beams. Etched microchannels were used to create highly collimated, continuous rubidium atom beams traveling parallel to a silicon wafer surface. Precise, lithographic definition of the guiding channels allowed for shaping and tailoring the velocity distributions in ways not possible using conventional machining. Multiple miniature beams with individually prescribed geometries were created, including collimated, focusing and diverging outputs. A “cascaded” collimator was realized with 40 times greater purity than conventional collimators. These localized, miniature atom beam sources can be a valuable resource for a number of quantum technologies, including atom interferometers, clocks, Rydberg atoms, and hybrid atom-nanophotonic systems, as well as enabling controlled studies of atom-surface interactions at the nanometer scale.

Date: 2019
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DOI: 10.1038/s41467-019-09647-3

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