Boundary-directed epitaxy of block copolymers

Robert M. Jacobberger, Vikram Thapar, Guang-Peng Wu (), Tzu-Hsuan Chang, Vivek Saraswat, Austin J. Way, Katherine R. Jinkins, Zhenqiang Ma, Paul F. Nealey, Su-Mi Hur (), Shisheng Xiong () and Michael S. Arnold ()
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Robert M. Jacobberger: University of Wisconsin-Madison
Vikram Thapar: Chonnam National University
Guang-Peng Wu: University of Chicago
Tzu-Hsuan Chang: University of Wisconsin-Madison
Vivek Saraswat: University of Wisconsin-Madison
Austin J. Way: University of Wisconsin-Madison
Katherine R. Jinkins: University of Wisconsin-Madison
Zhenqiang Ma: University of Wisconsin-Madison
Paul F. Nealey: University of Chicago
Su-Mi Hur: Chonnam National University
Shisheng Xiong: University of Chicago
Michael S. Arnold: University of Wisconsin-Madison

Nature Communications, 2020, vol. 11, issue 1, 1-10

Abstract: Abstract Directed self-assembly of block copolymers (BCPs) enables nanofabrication at sub-10 nm dimensions, beyond the resolution of conventional lithography. However, directing the position, orientation, and long-range lateral order of BCP domains to produce technologically-useful patterns is a challenge. Here, we present a promising approach to direct assembly using spatial boundaries between planar, low-resolution regions on a surface with different composition. Pairs of boundaries are formed at the edges of isolated stripes on a background substrate. Vertical lamellae nucleate at and are pinned by chemical contrast at each stripe/substrate boundary, align parallel to boundaries, selectively propagate from boundaries into stripe interiors (whereas horizontal lamellae form on the background), and register to wide stripes to multiply the feature density. Ordered BCP line arrays with half-pitch of 6.4 nm are demonstrated on stripes >80 nm wide. Boundary-directed epitaxy provides an attractive path towards assembling, creating, and lithographically defining materials on sub-10 nm scales.

Date: 2020
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DOI: 10.1038/s41467-020-17938-3

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