A self-healing catalyst for electrocatalytic and photoelectrochemical oxygen evolution in highly alkaline conditions

Chao Feng, Faze Wang, Zhi Liu, Mamiko Nakabayashi, Yequan Xiao, Qiugui Zeng, Jie Fu, Qianbao Wu, Chunhua Cui, Yifan Han, Naoya Shibata, Kazunari Domen, Ian D. Sharp () and Yanbo Li ()
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Chao Feng: University of Electronic Science and Technology of China
Faze Wang: University of Electronic Science and Technology of China
Zhi Liu: University of Electronic Science and Technology of China
Mamiko Nakabayashi: The University of Tokyo
Yequan Xiao: University of Electronic Science and Technology of China
Qiugui Zeng: University of Electronic Science and Technology of China
Jie Fu: University of Electronic Science and Technology of China
Qianbao Wu: University of Electronic Science and Technology of China
Chunhua Cui: University of Electronic Science and Technology of China
Yifan Han: Zhengzhou University
Naoya Shibata: The University of Tokyo
Kazunari Domen: Office of University Professors, The University of Tokyo
Ian D. Sharp: Technische Universität München
Yanbo Li: University of Electronic Science and Technology of China

Nature Communications, 2021, vol. 12, issue 1, 1-10

Abstract: Abstract While self-healing is considered a promising strategy to achieve long-term stability for oxygen evolution reaction (OER) catalysts, this strategy remains a challenge for OER catalysts working in highly alkaline conditions. The self-healing of the OER-active nickel iron layered double hydroxides (NiFe-LDH) has not been successful due to irreversible leaching of Fe catalytic centers. Here, we investigate the introduction of cobalt (Co) into the NiFe-LDH as a promoter for in situ Fe redeposition. An active borate-intercalated NiCoFe-LDH catalyst is synthesized using electrodeposition and shows no degradation after OER tests at 10 mA cm−2 at pH 14 for 1000 h, demonstrating its self-healing ability under harsh OER conditions. Importantly, the presence of both ferrous ions and borate ions in the electrolyte is found to be crucial to the catalyst’s self-healing. Furthermore, the implementation of this catalyst in photoelectrochemical devices is demonstrated with an integrated silicon photoanode. The self-healing mechanism leads to a self-limiting catalyst thickness, which is ideal for integration with photoelectrodes since redeposition is not accompanied by increased parasitic light absorption.

Date: 2021
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DOI: 10.1038/s41467-021-26281-0

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