Solvent-free bottom-up patterning of zeolitic imidazolate frameworks

Yurun Miao, Dennis T. Lee, Matheus Dorneles Mello, Mueed Ahmad, Mohammed K. Abdel-Rahman, Patrick M. Eckhert, J. Anibal Boscoboinik, D. Howard Fairbrother and Michael Tsapatsis ()
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Yurun Miao: Johns Hopkins University
Dennis T. Lee: Johns Hopkins University
Matheus Dorneles Mello: Brookhaven National Laboratory
Mueed Ahmad: Brookhaven National Laboratory
Mohammed K. Abdel-Rahman: Johns Hopkins University
Patrick M. Eckhert: Johns Hopkins University
J. Anibal Boscoboinik: Brookhaven National Laboratory
D. Howard Fairbrother: Johns Hopkins University
Michael Tsapatsis: Johns Hopkins University

Nature Communications, 2022, vol. 13, issue 1, 1-8

Abstract: Abstract Patterning metal-organic frameworks (MOFs) at submicrometer scale is a crucial yet challenging task for their integration in miniaturized devices. Here we report an electron beam (e-beam) assisted, bottom-up approach for patterning of two MOFs, zeolitic imidazolate frameworks (ZIF), ZIF-8 and ZIF-67. A mild pretreatment of metal oxide precursors with linker vapor leads to the sensitization of the oxide surface to e-beam irradiation, effectively inhibiting subsequent conversion of the oxide to ZIFs in irradiated areas, while ZIF growth in non-irradiated areas is not affected. Well-resolved patterns with features down to the scale of 100 nm can be achieved. This developer-free, all-vapor phase technique will facilitate the incorporation of MOFs in micro- and nanofabrication processes.

Date: 2022
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DOI: 10.1038/s41467-022-28050-z

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