High-mobility hydrogenated polycrystalline In2O3 (In2O3:H) thin-film transistors

Yusaku Magari (), Taiki Kataoka, Wenchang Yeh and Mamoru Furuta
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Yusaku Magari: Shimane University
Taiki Kataoka: Kochi University of Technology
Wenchang Yeh: Shimane University
Mamoru Furuta: Kochi University of Technology

Nature Communications, 2022, vol. 13, issue 1, 1-8

Abstract: Abstract Oxide semiconductors have been extensively studied as active channel layers of thin-film transistors (TFTs) for electronic applications. However, the field-effect mobility (μFE) of oxide TFTs is not sufficiently high to compete with that of low-temperature-processed polycrystalline-Si TFTs (50–100 cm2V−1s−1). Here, we propose a simple process to obtain high-performance TFTs, namely hydrogenated polycrystalline In2O3 (In2O3:H) TFTs grown via the low-temperature solid-phase crystallization (SPC) process. In2O3:H TFTs fabricated at 300 °C exhibit superior switching properties with µFE = 139.2 cm2V−1s−1, a subthreshold swing of 0.19 Vdec−1, and a threshold voltage of 0.2 V. The hydrogen introduced during sputter deposition plays an important role in enlarging the grain size and decreasing the subgap defects in SPC-prepared In2O3:H. The proposed method does not require any additional expensive equipment and/or change in the conventional oxide TFT fabrication process. We believe these SPC-grown In2O3:H TFTs have a great potential for use in future transparent or flexible electronics applications.

Date: 2022
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DOI: 10.1038/s41467-022-28480-9

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