Publisher Correction: Gradient area-selective deposition for seamless gap-filling in 3D nanostructures through surface chemical reactivity control

Chi Thang Nguyen, Eun-Hyoung Cho, Bonwook Gu, Sunghee Lee, Hae-Sung Kim, Jeongwoo Park, Neung-Kyung Yu, Sangwoo Shin, Bonggeun Shong, Jeong Yub Lee and Han-Bo-Ram Lee ()
Additional contact information
Chi Thang Nguyen: Incheon National University
Eun-Hyoung Cho: Samsung Advanced Institute of Technology
Bonwook Gu: Incheon National University
Sunghee Lee: Samsung Advanced Institute of Technology
Hae-Sung Kim: Samsung Advanced Institute of Technology
Jeongwoo Park: Hongik University
Neung-Kyung Yu: Hongik University
Sangwoo Shin: University at Buffalo
Bonggeun Shong: Hongik University
Jeong Yub Lee: Samsung Advanced Institute of Technology
Han-Bo-Ram Lee: Incheon National University

Nature Communications, 2023, vol. 14, issue 1, 1-1

Date: 2023
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DOI: 10.1038/s41467-023-35883-9

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