Sub-10 fJ/bit radiation-hard nanoelectromechanical non-volatile memory
Yong-Bok Lee,
Min-Ho Kang,
Pan-Kyu Choi,
Su-Hyun Kim,
Tae-Soo Kim,
So-Young Lee and
Jun-Bo Yoon ()
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Yong-Bok Lee: School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST)
Min-Ho Kang: National NanoFab Center (NNFC)
Pan-Kyu Choi: School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST)
Su-Hyun Kim: School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST)
Tae-Soo Kim: School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST)
So-Young Lee: School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST)
Jun-Bo Yoon: School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST)
Nature Communications, 2023, vol. 14, issue 1, 1-9
Abstract:
Abstract With the exponential growth of the semiconductor industry, radiation-hardness has become an indispensable property of memory devices. However, implementation of radiation-hardened semiconductor memory devices inevitably requires various radiation-hardening technologies from the layout level to the system level, and such technologies incur a significant energy overhead. Thus, there is a growing demand for emerging memory devices that are energy-efficient and intrinsically radiation-hard. Here, we report a nanoelectromechanical non-volatile memory (NEM-NVM) with an ultra-low energy consumption and radiation-hardness. To achieve an ultra-low operating energy of less than 10 $${{{{{{\rm{fJ\; bit}}}}}}}^{-1}$$ fJ bit − 1 , we introduce an out-of-plane electrode configuration and electrothermal erase operation. These approaches enable the NEM-NVM to be programmed with an ultra-low energy of 2.83 $${{{{{{\rm{fJ\; bit}}}}}}}^{-1}$$ fJ bit − 1 . Furthermore, due to its mechanically operating mechanisms and radiation-robust structural material, the NEM-NVM retains its superb characteristics without radiation-induced degradation such as increased leakage current, threshold voltage shift, and unintended bit-flip even after 1 Mrad irradiation.
Date: 2023
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Persistent link: https://EconPapers.repec.org/RePEc:nat:natcom:v:14:y:2023:i:1:d:10.1038_s41467-023-36076-0
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DOI: 10.1038/s41467-023-36076-0
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