Quasi-seamless stitching for large-area micropatterned surfaces enabled by Fourier spectral analysis of moiré patterns

Woo Young Kim, Bo Wook Seo, Sang Hoon Lee, Tae Gyung Lee, Sin Kwon, Won Seok Chang, Sang-Hoon Nam, Nicholas X. Fang, Seok Kim () and Young Tae Cho ()
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Woo Young Kim: Changwon National University
Bo Wook Seo: Changwon National University
Sang Hoon Lee: Changwon National University
Tae Gyung Lee: Changwon National University
Sin Kwon: Korea Institute of Machinery and Materials
Won Seok Chang: Korea Institute of Machinery and Materials
Sang-Hoon Nam: Massachusetts Institute of Technology
Nicholas X. Fang: Massachusetts Institute of Technology
Seok Kim: Changwon National University
Young Tae Cho: Changwon National University

Nature Communications, 2023, vol. 14, issue 1, 1-9

Abstract: Abstract The main challenge in preparing a flexible mold stamp using roll-to-roll nanoimprint lithography is to simultaneously increase the imprintable area with a minimized perceptible seam. However, the current methods for stitching multiple small molds to fabricate large-area molds and functional surfaces typically rely on the alignment mark, which inevitably produces a clear alignment mark and stitched seam. In this study, we propose a mark-less alignment by the pattern itself method inspired by moiré technique, which uses the Fourier spectral analysis of moiré patterns formed by superposed identical patterns for alignment. This method is capable of fabricating scalable functional surfaces and imprint molds with quasi-seamless and alignment mark-free patterning. By harnessing the rotational invariance property in the Fourier transform, our approach is confirmed to be a simple and efficient method for extracting the rotational and translational offsets in overlapped periodic or nonperiodic patterns with a minimized stitched region, thereby allowing for the large-area and quasi-seamless fabrication of imprinting molds and functional surfaces, such as liquid-repellent film and micro-optical sheets, that surpass the conventional alignment and stitching limits and potentially expand their application in producing large-area metasurfaces.

Date: 2023
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DOI: 10.1038/s41467-023-37828-8

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