Roll-to-plate 0.1-second shear-rolling process at elevated temperature for highly aligned nanopatterns

Junghyun Cho, Jinwoo Oh, Joona Bang, Jai Hyun Koh, Hoon Yeub Jeong, Seungjun Chung and Jeong Gon Son ()
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Junghyun Cho: Korea Institute of Science and Technology (KIST), Seongbuk-gu
Jinwoo Oh: Korea Institute of Science and Technology (KIST), Seongbuk-gu
Joona Bang: Korea University, Seongbuk-gu
Jai Hyun Koh: Korea Institute of Science and Technology (KIST), Seongbuk-gu
Hoon Yeub Jeong: Korea Institute of Science and Technology (KIST), Seongbuk-gu
Seungjun Chung: Korea Institute of Science and Technology (KIST), Seongbuk-gu
Jeong Gon Son: Korea Institute of Science and Technology (KIST), Seongbuk-gu

Nature Communications, 2023, vol. 14, issue 1, 1-10

Abstract: Abstract The shear-rolling process is a promising directed self-assembly method that can produce high-quality sub−10 nm block copolymer line-space patterns cost-effectively and straightforwardly over a large area. This study presents a high temperature (280 °C) and rapid (~0.1 s) shear-rolling process that can achieve a high degree of orientation in a single process while effectively preventing film delamination, that can be applied to large-area continuous processes. By minimizing adhesion, normal forces, and ultimate shear strain of the polydimethylsiloxane pad, shearing was successfully performed without peeling up to 280 °C at which the chain mobility significantly increases. This method can be utilized for various high-χ block copolymers and surface neutralization processes. It enables the creation of block copolymer patterns with a half-pitch as small as 8 nm in a unidirectional way. Moreover, the 0.1-second rapid shear-rolling was successfully performed on long, 3-inch width polyimide flexible films to validate its potential for the roll-to-roll process.

Date: 2023
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DOI: 10.1038/s41467-023-43766-2

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