EUV-induced hydrogen desorption as a step towards large-scale silicon quantum device patterning

Procopios Constantinou (), Taylor J. Z. Stock, Li-Ting Tseng, Dimitrios Kazazis, Matthias Muntwiler, Carlos A. F. Vaz, Yasin Ekinci, Gabriel Aeppli, Neil J. Curson and Steven R. Schofield ()
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Procopios Constantinou: University College London
Taylor J. Z. Stock: University College London
Li-Ting Tseng: Paul Scherrer Institute
Dimitrios Kazazis: Paul Scherrer Institute
Matthias Muntwiler: Paul Scherrer Institute
Carlos A. F. Vaz: Paul Scherrer Institute
Yasin Ekinci: Paul Scherrer Institute
Gabriel Aeppli: Paul Scherrer Institute
Neil J. Curson: University College London
Steven R. Schofield: University College London

Nature Communications, 2024, vol. 15, issue 1, 1-13

Abstract: Abstract Atomically precise hydrogen desorption lithography using scanning tunnelling microscopy (STM) has enabled the development of single-atom, quantum-electronic devices on a laboratory scale. Scaling up this technology to mass-produce these devices requires bridging the gap between the precision of STM and the processes used in next-generation semiconductor manufacturing. Here, we demonstrate the ability to remove hydrogen from a monohydride Si(001):H surface using extreme ultraviolet (EUV) light. We quantify the desorption characteristics using various techniques, including STM, X-ray photoelectron spectroscopy (XPS), and photoemission electron microscopy (XPEEM). Our results show that desorption is induced by secondary electrons from valence band excitations, consistent with an exactly solvable non-linear differential equation and compatible with the current 13.5 nm (~92 eV) EUV standard for photolithography; the data imply useful exposure times of order minutes for the 300 W sources characteristic of EUV infrastructure. This is an important step towards the EUV patterning of silicon surfaces without traditional resists, by offering the possibility for parallel processing in the fabrication of classical and quantum devices through deterministic doping.

Date: 2024
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DOI: 10.1038/s41467-024-44790-6

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