Button shear testing for adhesion measurements of 2D materials

Josef Schätz, Navin Nayi, Jonas Weber, Christoph Metzke, Sebastian Lukas, Jürgen Walter, Tim Schaffus, Fabian Streb, Eros Reato, Agata Piacentini, Annika Grundmann, Holger Kalisch, Michael Heuken, Andrei Vescan, Stephan Pindl and Max C. Lemme ()
Additional contact information
Josef Schätz: Infineon Technologies AG
Navin Nayi: Infineon Technologies AG
Jonas Weber: Deggendorf Institute of Technology
Christoph Metzke: Deggendorf Institute of Technology
Sebastian Lukas: RWTH Aachen University
Jürgen Walter: Infineon Technologies AG
Tim Schaffus: Infineon Technologies AG
Fabian Streb: Infineon Technologies AG
Eros Reato: RWTH Aachen University
Agata Piacentini: RWTH Aachen University
Annika Grundmann: RWTH Aachen University
Holger Kalisch: RWTH Aachen University
Michael Heuken: RWTH Aachen University
Andrei Vescan: RWTH Aachen University
Stephan Pindl: Infineon Technologies AG
Max C. Lemme: RWTH Aachen University

Nature Communications, 2024, vol. 15, issue 1, 1-11

Abstract: Abstract Two-dimensional (2D) materials are considered for numerous applications in microelectronics, although several challenges remain when integrating them into functional devices. Weak adhesion is one of them, caused by their chemical inertness. Quantifying the adhesion of 2D materials on three-dimensional surfaces is, therefore, an essential step toward reliable 2D device integration. To this end, button shear testing is proposed and demonstrated as a method for evaluating the adhesion of 2D materials with the examples of graphene, hexagonal boron nitride (hBN), molybdenum disulfide, and tungsten diselenide on silicon dioxide and silicon nitride substrates. We propose a fabrication process flow for polymer buttons on the 2D materials and establish suitable button dimensions and testing shear speeds. We show with our quantitative data that low substrate roughness and oxygen plasma treatments on the substrates before 2D material transfer result in higher shear strengths. Thermal annealing increases the adhesion of hBN on silicon dioxide and correlates with the thermal interface resistance between these materials. This establishes button shear testing as a reliable and repeatable method for quantifying the adhesion of 2D materials.

Date: 2024
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DOI: 10.1038/s41467-024-46136-8

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