How molecular architecture defines quantum yields

Fred Pashley-Johnson, Rangika Munaweera, Sheikh I. Hossain, Steven C. Gauci, Laura Delafresnaye, Hendrik Frisch, Megan L. O’Mara (), Filip E. Du Prez () and Christopher Barner-Kowollik ()
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Fred Pashley-Johnson: Queensland University of Technology (QUT)
Rangika Munaweera: The University of Queensland
Sheikh I. Hossain: The University of Queensland
Steven C. Gauci: Queensland University of Technology (QUT)
Laura Delafresnaye: Queensland University of Technology (QUT)
Hendrik Frisch: Queensland University of Technology (QUT)
Megan L. O’Mara: The University of Queensland
Filip E. Du Prez: Ghent University
Christopher Barner-Kowollik: Queensland University of Technology (QUT)

Nature Communications, 2024, vol. 15, issue 1, 1-9

Abstract: Abstract Understanding the intricate relationship between molecular architecture and function underpins most challenges at the forefront of chemical innovation. Bond-forming reactions are particularly influenced by the topology of a chemical structure, both on small molecule scale and in larger macromolecular frameworks. Herein, we elucidate the impact that molecular architecture has on the photo-induced cyclisations of a series of monodisperse macromolecules with defined spacers between photodimerisable moieties, and examine the relationship between propensity for intramolecular cyclisation and intermolecular network formation. We demonstrate a goldilocks zone of maximum reactivity between the sterically hindered and entropically limited regimes with a quantum yield of intramolecular cyclisation that is nearly an order of magnitude higher than the lowest value. As a result of the molecular design of trifunctional macromolecules, their quantum yields can be deconvoluted into the formation of two different cyclic isomers, as rationalised with molecular dynamics simulations. Critically, we visualise our solution-based studies with light-based additive manufacturing. We formulate four photoresists for microprinting, revealing that the precise positioning of functional groups is critical for resist performance, with lower intramolecular quantum yields leading to higher-quality printing in most cases.

Date: 2024
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DOI: 10.1038/s41467-024-50366-1

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