Quantifying the ultimate limit of plasmonic near-field enhancement

Zhengyi Lu, Jiamin Ji, Haiming Ye, Hao Zhang, Shunping Zhang () and Hongxing Xu
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Zhengyi Lu: Wuhan University
Jiamin Ji: Wuhan University
Haiming Ye: Wuhan University
Hao Zhang: Wuhan University
Shunping Zhang: Wuhan University
Hongxing Xu: Wuhan University

Nature Communications, 2024, vol. 15, issue 1, 1-8

Abstract: Abstract Quantitatively probing the ultimate limit of near-field enhancement around plasmonic nanostructures remains elusive, despite more than five decades since the discovery of surface-enhanced Raman scattering. Theoretical calculations have predicted an ultimate near-field enhancement exceeding 1000 using the best plasmonic material silver, but experimental estimations disperse by orders of magnitude. Here, we design a high-quality silver plasmonic nanocavity with atomic precision and precisely quantify the upper limit of near-field enhancement in ~1 nm junctions. A hot-spot averaged Raman enhancement of 4.27 × 1010 is recorded with a small fluctuation, corresponding to an averaged electric field enhancement larger than 1000 times. This result quantitatively delineates the ultimate limit of plasmonic field enhancement around plasmonic nanostructures, establishing a foundation for diverse plasmon-enhanced processes and strong light-matter interactions at the atomic scale.

Date: 2024
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DOI: 10.1038/s41467-024-53210-8

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