Compositionally-graded ferroelectric thin films by solution epitaxy produce excellent dielectric stability
Ruian Zhang,
Chen Lin,
Hongliang Dong,
Haojie Han,
Yu Song,
Yiran Sun,
Yue Wang,
Zijun Zhang,
Xiaohe Miao,
Yongjun Wu,
Zhe Ren,
Qiaoshi Zeng (),
Houbing Huang,
Jing Ma,
He Tian (),
Zhaohui Ren () and
Gaorong Han ()
Additional contact information
Ruian Zhang: Zhejiang University
Chen Lin: Zhejiang University
Hongliang Dong: Center for High Pressure Science and Technology Advanced Research
Haojie Han: Tsinghua University
Yu Song: Beijing Institute of Technology
Yiran Sun: Zhejiang University
Yue Wang: Tsinghua University
Zijun Zhang: Zhejiang University
Xiaohe Miao: Westlake University
Yongjun Wu: Zhejiang University
Zhe Ren: Chinese Academy of Sciences
Qiaoshi Zeng: Center for High Pressure Science and Technology Advanced Research
Houbing Huang: Beijing Institute of Technology
Jing Ma: Tsinghua University
He Tian: Zhejiang University
Zhaohui Ren: Zhejiang University
Gaorong Han: Zhejiang University
Nature Communications, 2025, vol. 16, issue 1, 1-10
Abstract:
Abstract The composition in ferroelectric oxide films is decisive for optimizing properties and device performances. Controlling a composition distribution in these films by a facile approach is thus highly desired. In this work, we report a solution epitaxy of PbZrxTi1−xO3 films with a continuous gradient of Zr concentration, realized by a competitive growth at ~220 °C. These intriguing films demonstrate a frequency-independent of dielectric permittivity below 100 kHz from room-temperature to 280 °C. In particular, the permittivity of the films can be largely regulated from 100 to 50 by slightly varying Zr compositional gradient. These results were revealed to arise from a built-in electric field within the films due to a coupling between the composition gradient and unidirectional spontaneous polarization. Our findings may pave a way to prepare compositionally-graded ferroelectric films by a solution approach, which is promising for practical dielectric, pyroelectric and photoelectric technical applications.
Date: 2025
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Persistent link: https://EconPapers.repec.org/RePEc:nat:natcom:v:16:y:2025:i:1:d:10.1038_s41467-024-55411-7
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DOI: 10.1038/s41467-024-55411-7
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