Principles for fabricating moisture barrier films via stacked Janus graphene layers

Chaofan Zhou, Hongjie Gao, Saiyu Bu, Haotian Wu, Fan Liang, Fangfang Li, Zhaoning Hu, Yixuan Zhao, Bingbing Guo, Zelong Li, Li Yin, Xiaokai Hu, Qin Xie, Yang Su, Zhongfan Liu and Li Lin ()
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Chaofan Zhou: Peking University
Hongjie Gao: Peking University
Saiyu Bu: Peking University
Haotian Wu: Peking University
Fan Liang: Peking University
Fangfang Li: Peking University
Zhaoning Hu: Peking University
Yixuan Zhao: Peking University
Bingbing Guo: Beijing Graphene Institute
Zelong Li: Beijing Graphene Institute
Li Yin: Peking University
Xiaokai Hu: Guilin University of Electronic Technology
Qin Xie: Peking University
Yang Su: Tsinghua University
Zhongfan Liu: Peking University
Li Lin: Peking University

Nature Communications, 2025, vol. 16, issue 1, 1-10

Abstract: Abstract The excellent impermeability makes graphene film an ideal candidate for thin film encapsulation technology. However, current chemical vapor deposition (CVD) graphene-based barrier films can not provide sufficient moisture barrier performance, suggesting a lack of understanding in mechanism that dominates water diffusion in/through graphene stacks. Herein, we fabricate large-area graphene barrier films with a record-low water vapor transmission rate (WVTR) of 5 × 10−5 g/(m2·day), two orders of magnitude lower than previous works, in which two stacked Janus graphene films are intercalated by toluidine blue O (TBO) sub-monolayer: one side of graphene is decorated with fluorine- and oxygen-containing groups to allow crack-free transfer, while the other side is functionalized with hydroxyl groups to trap water. The intercalated TBO further blocks water transport due to a strong water-TBO interaction. Our work opens a route for surface/interface engineering of CVD graphene and promises its exciting future in the applications for advanced packaging.

Date: 2025
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DOI: 10.1038/s41467-025-58799-y

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