Reversible control over the distribution of chemical inhomogeneities in multiferroic BiFeO3

M. Müller, B. Yan, H. Ko, Y.-L. Huang, H. Lu, A. Gruverman, R. Ramesh, M. D. Rossell, M. Fiebig and M. Trassin ()
Additional contact information
M. Müller: ETH Zurich
B. Yan: ETH Zurich
H. Ko: ETH Zurich
Y.-L. Huang: National Yang Ming Chiao Tung University
H. Lu: University of Nebraska
A. Gruverman: University of Nebraska
R. Ramesh: University of California Berkeley
M. D. Rossell: Swiss Federal Laboratories for Materials Science and Technology
M. Fiebig: ETH Zurich
M. Trassin: ETH Zurich

Nature Communications, 2025, vol. 16, issue 1, 1-9

Abstract: Abstract Despite the appeal of flawless order, semiconductor technology has demonstrated that implanting inhomogeneities into single-crystalline materials is pivotal for modern electronics. However, the influence of the local arrangement of chemical inhomogeneities on the material’s functionalities is underexplored. In this work, we control the distribution of chemical inhomogeneities in La3+-substituted ferroelectric BiFeO3 thin films. By means of a stress- and composition-driven phase transition, we trigger the formation of a lattice of La3+-rich and La3+-poor layers. This ordering correlates with the emergence of an antipolar phase. An electric field restores the original ferroelectric phase and re-randomizes the distribution of the La3+ inhomogeneities. Leveraging these insights, we tune the polar/antipolar phase coexistence to set the net polarization of La0.15Bi0.85FeO3 to any desired value between its saturation limits. Finally, we control the net polarization response in device-compliant capacitor heterostructures to show that inhomogeneity-distribution control is a valuable tool in the design of functional oxide electronics.

Date: 2025
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DOI: 10.1038/s41467-025-59044-2

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