Sub-pA dark current infrared photodetection enabled by polarized water-intercalated heterojunctions

Chang Liu, Lin Tang, Yawei Lv (), Long Chen, Yilu Qin, Sen Zhang, Shihao Zhao, Shuimei Ding, Xin Zhang, Pan Xu, Chao Ma, Xingqiang Liu, Fang Wang, Peng Wang, Xudong Wang, Yuan Liu, En-Ge Wang, Lei Liao () and Xuming Zou ()
Additional contact information
Chang Liu: Hunan University
Lin Tang: Hunan University
Yawei Lv: Hunan University
Long Chen: Hunan University
Yilu Qin: Chinese Academy of Sciences
Sen Zhang: Hunan University
Shihao Zhao: Hunan University
Shuimei Ding: Hunan University
Xin Zhang: Hunan University
Pan Xu: Hunan University
Chao Ma: Hunan University
Xingqiang Liu: Hunan University
Fang Wang: Chinese Academy of Sciences
Peng Wang: Chinese Academy of Sciences
Xudong Wang: Chinese Academy of Sciences
Yuan Liu: Hunan University
En-Ge Wang: Peking University
Lei Liao: Hunan University
Xuming Zou: Hunan University

Nature Communications, 2025, vol. 16, issue 1, 1-11

Abstract: Abstract Barrier detectors such as nBn and pBp architectures (formed by a n- or p-type contact layer, a barrier layer and a n- or p-type absorber) aim to block one carrier type while allowing the other to pass, but require complex hetero-integration and precise band engineering. Here, we propose an ultra-thin polar barrier strategy using a 0.75 nm water-intercalated WSe2/H2O/PdSe2 heterostructure. The confined water layer forms a clean, well-ordered interface and further generates a precisely oriented polarization field that depletes electrons in WSe2, significantly suppressing dark current to sub-pA levels across all biases, while enabling efficient tunneling of photogenerated holes. The device shows broadband photoresponse from the ultraviolet to mid-wave infrared (MWIR), with a room-temperature average detectivity exceeding 10¹⁰ cm Hz¹/² W⁻¹ in the MWIR. It also features ultrafast response (~3 μs), polarization light sensitivity, and two-year stability. Our work establishes a platform for high-performance infrared photodetection via van der Waals gap engineering.

Date: 2025
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DOI: 10.1038/s41467-025-59211-5

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