Large-scale organic nanowire lithography and electronics

Sung-Yong Min, Tae-Sik Kim, Beom Joon Kim, Himchan Cho, Yong-Young Noh, Hoichang Yang, Jeong Ho Cho and Tae-Woo Lee ()
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Sung-Yong Min: Pohang University of Science and Technology (POSTECH)
Tae-Sik Kim: Pohang University of Science and Technology (POSTECH)
Beom Joon Kim: SKKU Advanced Institute of Nanotechnology (SAINT) and Center for Human Interface Nano Technology (HINT), Sungkyunkwan University
Himchan Cho: Pohang University of Science and Technology (POSTECH)
Yong-Young Noh: Dongguk University
Hoichang Yang: Inha University
Jeong Ho Cho: SKKU Advanced Institute of Nanotechnology (SAINT) and Center for Human Interface Nano Technology (HINT), Sungkyunkwan University
Tae-Woo Lee: Pohang University of Science and Technology (POSTECH)

Nature Communications, 2013, vol. 4, issue 1, 1-9

Abstract: Abstract Controlled alignment and patterning of individual semiconducting nanowires at a desired position in a large area is a key requirement for electronic device applications. High-speed, large-area printing of highly aligned individual nanowires that allows control of the exact numbers of wires, and their orientations and dimensions is a significant challenge for practical electronics applications. Here we use a high-speed electrohydrodynamic organic nanowire printer to print large-area organic semiconducting nanowire arrays directly on device substrates in a precisely, individually controlled manner; this method also enables sophisticated large-area nanowire lithography for nano-electronics. We achieve a maximum field-effect mobility up to 9.7 cm2 V−1 s−1 with extremely low contact resistance (

Date: 2013
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DOI: 10.1038/ncomms2785

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