Desktop nanofabrication with massively multiplexed beam pen lithography

Xing Liao, Keith A. Brown, Abrin L. Schmucker, Guoliang Liu, Shu He, Wooyoung Shim and Chad A. Mirkin ()
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Xing Liao: Northwestern University
Keith A. Brown: International Institute for Nanotechnology, Northwestern University
Abrin L. Schmucker: International Institute for Nanotechnology, Northwestern University
Guoliang Liu: International Institute for Nanotechnology, Northwestern University
Shu He: International Institute for Nanotechnology, Northwestern University
Wooyoung Shim: Northwestern University
Chad A. Mirkin: Northwestern University

Nature Communications, 2013, vol. 4, issue 1, 1-7

Abstract: Abstract The development of a lithographic method that can rapidly define nanoscale features across centimetre-scale surfaces has been a long-standing goal for the nanotechnology community. If such a ‘desktop nanofab’ could be implemented in a low-cost format, it would bring the possibility of point-of-use nanofabrication for rapidly prototyping diverse functional structures. Here we report the development of a new tool that is capable of writing arbitrary patterns composed of diffraction-unlimited features over square centimetre areas that are in registry with existing patterns and nanostructures. Importantly, this instrument is based on components that are inexpensive compared with the combination of state-of-the-art nanofabrication tools that approach its capabilities. This tool can be used to prototype functional electronic devices in a mask-free fashion in addition to providing a unique platform for performing high-throughput nano- to macroscale photochemistry with relevance to biology and medicine.

Date: 2013
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DOI: 10.1038/ncomms3103

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