Defect-induced plating of lithium metal within porous graphene networks
Rahul Mukherjee,
Abhay V. Thomas,
Dibakar Datta,
Eklavya Singh,
Junwen Li,
Osman Eksik,
Vivek B. Shenoy and
Nikhil Koratkar ()
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Rahul Mukherjee: Mechanical, Aerospace and Nuclear Engineering, Rensselaer Polytechnic Institute
Abhay V. Thomas: Mechanical, Aerospace and Nuclear Engineering, Rensselaer Polytechnic Institute
Dibakar Datta: Mechanics of Solids and Structures, Brown University
Eklavya Singh: Mechanical, Aerospace and Nuclear Engineering, Rensselaer Polytechnic Institute
Junwen Li: Materials Science and Engineering, University of Pennsylvania
Osman Eksik: Mechanical, Aerospace and Nuclear Engineering, Rensselaer Polytechnic Institute
Vivek B. Shenoy: Materials Science and Engineering, University of Pennsylvania
Nikhil Koratkar: Mechanical, Aerospace and Nuclear Engineering, Rensselaer Polytechnic Institute
Nature Communications, 2014, vol. 5, issue 1, 1-10
Abstract:
Abstract Lithium metal is known to possess a very high theoretical capacity of 3,842 mAh g−1 in lithium batteries. However, the use of metallic lithium leads to extensive dendritic growth that poses serious safety hazards. Hence, lithium metal has long been replaced by layered lithium metal oxide and phospho-olivine cathodes that offer safer performance over extended cycling, although significantly compromising on the achievable capacities. Here we report the defect-induced plating of metallic lithium within the interior of a porous graphene network. The network acts as a caged entrapment for lithium metal that prevents dendritic growth, facilitating extended cycling of the electrode. The plating of lithium metal within the interior of the porous graphene structure results in very high specific capacities in excess of 850 mAh g−1. Extended testing for over 1,000 charge/discharge cycles indicates excellent reversibility and coulombic efficiencies above 99%.
Date: 2014
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Persistent link: https://EconPapers.repec.org/RePEc:nat:natcom:v:5:y:2014:i:1:d:10.1038_ncomms4710
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DOI: 10.1038/ncomms4710
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