Ultra-high aspect ratio high-resolution nanofabrication for hard X-ray diffractive optics
Chieh Chang and
Anne Sakdinawat ()
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Chieh Chang: SLAC National Accelerator Laboratory, Stanford Synchrotron Radiation Lightsource
Anne Sakdinawat: SLAC National Accelerator Laboratory, Stanford Synchrotron Radiation Lightsource
Nature Communications, 2014, vol. 5, issue 1, 1-7
Abstract:
Abstract Although diffractive optics have played a major role in nanoscale soft X-ray imaging, high-resolution and high-efficiency diffractive optics have largely been unavailable for hard X-rays where many scientific, technological and biomedical applications exist. This is owing to the long-standing challenge of fabricating ultra-high aspect ratio high-resolution dense nanostructures. Here we report significant progress in ultra-high aspect ratio nanofabrication of high-resolution, dense silicon nanostructures using vertical directionality controlled metal-assisted chemical etching. The resulting structures have very smooth sidewalls and can be used to pattern arbitrary features, not limited to linear or circular. We focus on the application of X-ray zone plate fabrication for high-efficiency, high-resolution diffractive optics, and demonstrate the process with linear, circular, and spiral zone plates. X-ray measurements demonstrate high efficiency in the critical outer layers. This method has broad applications including patterning for thermoelectric materials, battery anodes and sensors among others.
Date: 2014
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Persistent link: https://EconPapers.repec.org/RePEc:nat:natcom:v:5:y:2014:i:1:d:10.1038_ncomms5243
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DOI: 10.1038/ncomms5243
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