Dip-pen patterning of poly(9,9-dioctylfluorene) chain-conformation-based nano-photonic elements

Aleksandr Perevedentsev, Yannick Sonnefraud, Colin R. Belton, Sanjiv Sharma, Anthony E. G. Cass, Stefan A. Maier, Ji-Seon Kim, Paul N. Stavrinou and Donal D. C. Bradley ()
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Aleksandr Perevedentsev: Imperial College London
Yannick Sonnefraud: Imperial College London
Colin R. Belton: Imperial College London
Sanjiv Sharma: Imperial College London
Anthony E. G. Cass: Imperial College London
Stefan A. Maier: Imperial College London
Ji-Seon Kim: Imperial College London
Paul N. Stavrinou: Imperial College London
Donal D. C. Bradley: Imperial College London

Nature Communications, 2015, vol. 6, issue 1, 1-9

Abstract: Abstract Metamaterials are a promising new class of materials, in which sub-wavelength physical structures, rather than variations in chemical composition, can be used to modify the nature of their interaction with electromagnetic radiation. Here we show that a metamaterials approach, using a discrete physical geometry (conformation) of the segments of a polymer chain as the vector for a substantial refractive index change, can be used to enable visible wavelength, conjugated polymer photonic elements. In particular, we demonstrate that a novel form of dip-pen nanolithography provides an effective means to pattern the so-called β-phase conformation in poly(9,9-dioctylfluorene) thin films. This can be done on length scales ≤500 nm, as required to fabricate a variety of such elements, two of which are theoretically modelled using complex photonic dispersion calculations.

Date: 2015
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DOI: 10.1038/ncomms6977

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