Long distance spin communication in chemical vapour deposited graphene

M. Venkata Kamalakar (), Christiaan Groenveld, André Dankert and Saroj P. Dash ()
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M. Venkata Kamalakar: Quantum Device Physics Laboratory, Chalmers University of Technology
Christiaan Groenveld: Quantum Device Physics Laboratory, Chalmers University of Technology
André Dankert: Quantum Device Physics Laboratory, Chalmers University of Technology
Saroj P. Dash: Quantum Device Physics Laboratory, Chalmers University of Technology

Nature Communications, 2015, vol. 6, issue 1, 1-8

Abstract: Abstract Graphene is an ideal medium for long-distance spin communication in future spintronic technologies. So far, the prospect is limited by the smaller sizes of exfoliated graphene flakes and lower spin transport properties of large-area chemical vapour-deposited (CVD) graphene. Here we demonstrate a high spintronic performance in CVD graphene on SiO2/Si substrate at room temperature. We show pure spin transport and precession over long channel lengths extending up to 16 μm with a spin lifetime of 1.2 ns and a spin diffusion length ∼6 μm at room temperature. These spin parameters are up to six times higher than previous reports and highest at room temperature for any form of pristine graphene on industrial standard SiO2/Si substrates. Our detailed investigation reinforces the observed performance in CVD graphene over wafer scale and opens up new prospects for the development of lateral spin-based memory and logic applications.

Date: 2015
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DOI: 10.1038/ncomms7766

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