Ionization-induced annealing of pre-existing defects in silicon carbide

Yanwen Zhang (), Ritesh Sachan, Olli H. Pakarinen, Matthew F. Chisholm, Peng Liu, Haizhou Xue and William J. Weber ()
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Yanwen Zhang: Oak Ridge National Laboratory
Ritesh Sachan: Oak Ridge National Laboratory
Olli H. Pakarinen: Oak Ridge National Laboratory
Matthew F. Chisholm: Oak Ridge National Laboratory
Peng Liu: University of Tennessee
Haizhou Xue: University of Tennessee
William J. Weber: Oak Ridge National Laboratory

Nature Communications, 2015, vol. 6, issue 1, 1-7

Abstract: Abstract A long-standing objective in materials research is to effectively heal fabrication defects or to remove pre-existing or environmentally induced damage in materials. Silicon carbide (SiC) is a fascinating wide-band gap semiconductor for high-temperature, high-power and high-frequency applications. Its high corrosion and radiation resistance makes it a key refractory/structural material with great potential for extremely harsh radiation environments. Here we show that the energy transferred to the electron system of SiC by energetic ions via inelastic ionization can effectively anneal pre-existing defects and restore the structural order. The threshold determined for this recovery process reveals that it can be activated by 750 and 850 keV Si and C self-ions, respectively. The results conveyed here can contribute to SiC-based device fabrication by providing a room-temperature approach to repair atomic lattice structures, and to SiC performance prediction as either a functional material for device applications or a structural material for high-radiation environments.

Date: 2015
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DOI: 10.1038/ncomms9049

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