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Permanent ferroelectric retention of BiFeO3 mesocrystal

Ying-Hui Hsieh, Fei Xue, Tiannan Yang, Heng-Jui Liu, Yuanmin Zhu, Yi-Chun Chen, Qian Zhan, Chun-Gang Duan, Long-Qing Chen, Qing He and Ying-Hao Chu ()
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Ying-Hui Hsieh: National Chiao Tung University
Fei Xue: Pennsylvania State University
Tiannan Yang: Pennsylvania State University
Heng-Jui Liu: National Chiao Tung University
Yuanmin Zhu: School of Materials Science and Engineering, University of Science and Technology Beijing
Yi-Chun Chen: National Cheng Kung University
Qian Zhan: School of Materials Science and Engineering, University of Science and Technology Beijing
Chun-Gang Duan: Key Lab of Polar Materials and Devices, Ministry of Education, East China Normal University
Long-Qing Chen: Pennsylvania State University
Qing He: Durham University
Ying-Hao Chu: National Chiao Tung University

Nature Communications, 2016, vol. 7, issue 1, 1-9

Abstract: Abstract Non-volatile electronic devices based on magnetoelectric multiferroics have triggered new possibilities of outperforming conventional devices for applications. However, ferroelectric reliability issues, such as imprint, retention and fatigue, must be solved before the realization of practical devices. In this study, everlasting ferroelectric retention in the heteroepitaxially constrained multiferroic mesocrystal is reported, suggesting a new approach to overcome the failure of ferroelectric retention. Studied by scanning probe microscopy and transmission electron microscopy, and supported via the phase-field simulations, the key to the success of ferroelectric retention is to prevent the crystal from ferroelastic deformation during the relaxation of the spontaneous polarization in a ferroelectric nanocrystal.

Date: 2016
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DOI: 10.1038/ncomms13199

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