Simultaneous fabrication of line and dot dual nanopatterns using miktoarm block copolymer with photocleavable linker

Chungryong Choi, Jichoel Park, Kanniyambatti L. Vincent Joseph, Jaeyong Lee, Seonghyeon Ahn, Jongheon Kwak, Kyu Seong Lee and Jin Kon Kim ()
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Chungryong Choi: Pohang University of Science and Technology
Jichoel Park: Pohang University of Science and Technology
Kanniyambatti L. Vincent Joseph: Pohang University of Science and Technology
Jaeyong Lee: Pohang University of Science and Technology
Seonghyeon Ahn: Pohang University of Science and Technology
Jongheon Kwak: Pohang University of Science and Technology
Kyu Seong Lee: Pohang University of Science and Technology
Jin Kon Kim: Pohang University of Science and Technology

Nature Communications, 2017, vol. 8, issue 1, 1-8

Abstract: Abstract Block copolymers with various nanodomains, such as spheres, cylinders, and lamellae, have received attention for their applicability to nanolithography. However, those microdomains are determined by the volume fraction of one block. Meanwhile, nanopatterns with multiple shapes are required for the next-generation nanolithography. Although various methods have been reported to achieve dual nanopatterns, all the methods need sophisticated processes using E-beam. Here, we synthesized a miktoarm block copolymer capable of cleavage of one block by ultraviolet. Original cylindrical nanodomains of synthesized block copolymer were successfully transformed to lamellar nanodomains due to the change of molecular architecture by ultraviolet. We fabricated dual nanopatterns consisting of dots and lines at desired regions on a single substrate. We also prepared dual nanopatterns utilizing another phase transformation from spheres to cylinders in a block copolymer with higher interaction parameter. Since our concept has versatility to any block copolymer, it could be employed as next-generation nanolithography.

Date: 2017
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DOI: 10.1038/s41467-017-02019-9

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