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Alloy-assisted deposition of three-dimensional arrays of atomic gold catalyst for crystal growth studies

Yin Fang, Yuanwen Jiang, Mathew J. Cherukara, Fengyuan Shi, Kelliann Koehler, George Freyermuth, Dieter Isheim, Badri Narayanan, Alan W. Nicholls, David N. Seidman, Subramanian K. R. S. Sankaranarayanan () and Bozhi Tian ()
Additional contact information
Yin Fang: The University of Chicago
Yuanwen Jiang: The University of Chicago
Mathew J. Cherukara: Argonne National Laboratory
Fengyuan Shi: University of Illinois at Chicago
Kelliann Koehler: The University of Chicago
George Freyermuth: The University of Chicago
Dieter Isheim: Northwestern University
Badri Narayanan: Argonne National Laboratory
Alan W. Nicholls: University of Illinois at Chicago
David N. Seidman: Northwestern University
Subramanian K. R. S. Sankaranarayanan: Argonne National Laboratory
Bozhi Tian: The University of Chicago

Nature Communications, 2017, vol. 8, issue 1, 1-10

Abstract: Abstract Large-scale assembly of individual atoms over smooth surfaces is difficult to achieve. A configuration of an atom reservoir, in which individual atoms can be readily extracted, may successfully address this challenge. In this work, we demonstrate that a liquid gold–silicon alloy established in classical vapor–liquid–solid growth can deposit ordered and three-dimensional rings of isolated gold atoms over silicon nanowire sidewalls. We perform ab initio molecular dynamics simulation and unveil a surprising single atomic gold-catalyzed chemical etching of silicon. Experimental verification of this catalytic process in silicon nanowires yields dopant-dependent, massive and ordered 3D grooves with spacing down to ~5 nm. Finally, we use these grooves as self-labeled and ex situ markers to resolve several complex silicon growths, including the formation of nodes, kinks, scale-like interfaces, and curved backbones.

Date: 2017
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DOI: 10.1038/s41467-017-02025-x

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