AMD-FV: Adaptive margin loss and dual path network+ for deep face verification

Zeeshan Ahmed Khan, Waqar Ahmed and Panos Liatsis

PLOS ONE, 2025, vol. 20, issue 5, 1-21

Abstract: Face verification is important in a variety of applications, for instance, access control, surveillance, and identification. Existing methods often struggle with the challenges of dataset imbalance and manual hyperparameter tuning. To address this, we propose the Adaptive Margin Loss and Dual Path Network+ (AMD-FV) for deep face verification. Two innovations are introduced, namely, Adaptive Margin Loss (AML) and Dual Path Network+ (DPN+). AML aims at automating the selection of margin and scale hyperparameters in large margin loss functions, thus, eliminating the need for manual tuning. Input dissimilarity information is used to estimate the margin, while the scale parameter is computed using the number of classes and AML’s range. Next, DPN+ enhances the original Dual Path Network by redesigning the first block with a series of 3x3 convolutions, batch normalization, and ReLU activations, leveraging shared connections across layers, leading to increases in spatial resolution and computational cost efficiency, while maximizing the use of discriminative features. We present comprehensive experiments on five diverse face verification datasets (LFW, Megaface, IJB-B, CALFW, and CPLFW) to demonstrate the effectiveness of the proposed approach. The results show that AMD-FV outperforms state-of-the-art methods, achieving a verification accuracy of 99.75% on LFW, improving the True Acceptance Rate by 6% on IJB-B at a False Acceptance Rate of 0.001, compared to VGGFace2, and attaining a Rank-1 identification score of 92.16% on Megaface, surpassing the CosFace model by 9.44%.

Date: 2025
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Persistent link: https://EconPapers.repec.org/RePEc:plo:pone00:0324485

DOI: 10.1371/journal.pone.0324485

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