Correlation of process parameters and properties of TiO2 films grown by ion beam sputter deposition from a ceramic target

Carsten Bundesmann (), Thomas Lautenschläge, Daniel Spemann, Annemarie Finzel, Michael Mensing and Frank Frost
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Carsten Bundesmann: Leibniz-Institut für Oberflächenodifizierung e.V.
Thomas Lautenschläge: Leibniz-Institut für Oberflächenodifizierung e.V.
Daniel Spemann: Leibniz-Institut für Oberflächenodifizierung e.V.
Annemarie Finzel: Leibniz-Institut für Oberflächenodifizierung e.V.
Michael Mensing: Leibniz-Institut für Oberflächenodifizierung e.V.
Frank Frost: Leibniz-Institut für Oberflächenodifizierung e.V.

The European Physical Journal B: Condensed Matter and Complex Systems, 2017, vol. 90, issue 10, 1-11

Abstract: Abstract The correlation between process parameters and properties of TiO2 films grown by ion beam sputter deposition from a ceramic target was investigated. TiO2 films were grown under systematic variation of ion beam parameters (ion species, ion energy) and geometrical parameters (ion incidence angle, polar emission angle) and characterized with respect to film thickness, growth rate, structural properties, surface topography, composition, optical properties, and mass density. Systematic variations of film properties with the scattering geometry, namely the scattering angle, have been revealed. There are also considerable differences in film properties when changing the process gas from Ar to Xe. Similar systematics were reported for TiO2 films grown by reactive ion beam sputter deposition from a metal target [C. Bundesmann et al., Appl. Surf. Sci. 421, 331 (2017)]. However, there are some deviations from the previously reported data, for instance, in growth rate, mass density and optical properties.

Keywords: Solid; State; and; Materials (search for similar items in EconPapers)
Date: 2017
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DOI: 10.1140/epjb/e2017-80326-x

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