An experimental study of the static magnetic properties of Co thin films

A. Kharmouche ()
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A. Kharmouche: SETIF1 University Ferhat ABBAS

The European Physical Journal B: Condensed Matter and Complex Systems, 2024, vol. 97, issue 6, 1-9

Abstract: Abstract Thermal heating process has been used, under a pressure of 10−7 mbar, to deposit thin films of cobalt onto monocrystalline silicon substrate. The incident beam strikes the substrates under normal incidence. The thickness ranges from 50 to 400 nm. To investigate the static magnetic properties, the hysteresis loops are performed by means of alternating gradient field magnetometer device. The zero-field magnetic structure has been investigated by magnetic force microscopy (MFM) technique, using a Veeco 3100 apparatus. MFM images reveal well-defined stripe patterns, mainly for the thickest films, which infer the dominance of the magnetocrystalline anisotropy. The easy magnetization axis lies within the plane of the film with a small component out-of-the plane for the thicker films. Coercivity evolution versus thickness follows a t−n Néel law, characteristic of Bloch domain wall motion. In addition, it was found that coercivity depends plainly on the surface roughness of the films. Graphical abstract AFM (left) and MFM (right) images of Co thin films, with different thickness, (a) 100 nm, (b) 300 nm, (c) 400 nm. Scan area is 20 µm × 20 µm

Date: 2024
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DOI: 10.1140/epjb/s10051-024-00729-w

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