 Optimizing a blend of a mixture slurry in chemical mechanical planarization for advanced semiconductor manufacturing using a posterior preference articulation approach to dual response surface optimizationJihoon Seo, Dong‐Hee Lee, Kangchun Lee, Kijung Kim and Kwang‐Jae Kim Applied Stochastic Models in Business and Industry, 2016, vol. 32, issue 5, 648-659 Abstract: Semiconductors are fabricated through unit processes including photolithography, etching, diffusion, ion implantation, deposition, and planarization processes. Chemical mechanical planarization, which is essential in advanced semiconductor manufacturing processes, aims to achieve high planarity across the wafer surface. This paper presents a case study in which the optimal blend of mixture slurry was obtained to improve the two response variables (material loss and roughness) at the same time. The mixture slurry consists of several pure slurries; when all of the abrasive particles within the slurry are of the same size, the slurry is referred to as a pure slurry. The optimal blend was obtained by applying a multiresponse surface optimization method. In particular, the recently developed posterior approach to dual response surface optimization was employed, which allows the chemical mechanical planarization process engineer to investigate tradeoffs between the two response variables. The two responses were better with the obtained blend than the existing blend. Copyright © 2016 John Wiley & Sons, Ltd. Date: 2016 Downloads: (external link) Related works: Export reference: BibTeX RIS (EndNote, ProCite, RefMan) HTML/Text Persistent link: https://EconPapers.repec.org/RePEc:wly:apsmbi:v:32:y:2016:i:5:p:648-659 Access Statistics for this article More articles in Applied Stochastic Models in Business and Industry from John Wiley & Sons |
Is your work missing from RePEc? Here is how to contribute.
Questions or problems? Check the EconPapers FAQ or send mail to .
EconPapers is hosted by the
School of Business at Örebro University.