THE Cl/Si(100) INTERFACE OBSERVED BY ESDIAD AND RELATED TECHNIQUES

Q. Guo, D. Sterratt and E.M. Williams
Additional contact information
Q. Guo: IRC in Surface Science, The University of Liverpool, P.O. Box 147, Liverpool L69 3BX, UK
D. Sterratt: IRC in Surface Science, The University of Liverpool, P.O. Box 147, Liverpool L69 3BX, UK
E.M. Williams: IRC in Surface Science, The University of Liverpool, P.O. Box 147, Liverpool L69 3BX, UK

Surface Review and Letters (SRL), 1994, vol. 01, issue 04, 539-543

Abstract: The adsorption of chlorine on Si(100) surface has been studied using ESDIAD in conjunction with AES and gas uptake techniques. This work presents an extension of earlier studies of the adsorption of halogen gases at Si(100) which served to initiate our development of ESDIAD technique at the IRC. In the present instance, we report the findings in experiments with high-purity chlorine gas from a bottle, which is distinct from our earlier approach with an electrochemical cell for chlorine gas generation. Two types of adsorbate configurations which transform irreversibly are investigated.

Date: 1994
References: Add references at CitEc
Citations:

Downloads: (external link)
http://www.worldscientific.com/doi/abs/10.1142/S0218625X94000618
Access to full text is restricted to subscribers

Related works:
This item may be available elsewhere in EconPapers: Search for items with the same title.

Export reference: BibTeX RIS (EndNote, ProCite, RefMan) HTML/Text

Persistent link: https://EconPapers.repec.org/RePEc:wsi:srlxxx:v:01:y:1994:i:04:n:s0218625x94000618

Ordering information: This journal article can be ordered from

DOI: 10.1142/S0218625X94000618

Access Statistics for this article

Surface Review and Letters (SRL) is currently edited by S Y Tong

More articles in Surface Review and Letters (SRL) from World Scientific Publishing Co. Pte. Ltd.
Bibliographic data for series maintained by Tai Tone Lim ().