ELLIPSOMETRIC STUDIES OF VERY LOW PRESSURE THERMAL CVD GROWN SILICON NITRIDE THIN FILMS USING HYDRAZOIC ACID AND DICHLOROSILANE

A.S. Bridges, R. Greef, N.B.H. Jonathan, A. Morris and G.J. Parker
Additional contact information
A.S. Bridges: Department of Chemistry, University of Southampton, Highfield, Southampton, UK
R. Greef: Department of Chemistry, University of Southampton, Highfield, Southampton, UK
N.B.H. Jonathan: Department of Chemistry, University of Southampton, Highfield, Southampton, UK
A. Morris: Department of Chemistry, University of Southampton, Highfield, Southampton, UK
G.J. Parker: Department of Electronics and Computer Science, University of Southampton, Highfield, Southampton, UK

Surface Review and Letters (SRL), 1994, vol. 01, issue 04, 573-576

Abstract: High quality silicon nitride thin films have been grown using dichlorosilane and hydrazoic acid (ratio 1:5) at a total ambient growth pressure of1×10–4Torr. Sequential growth studies of successive CVD nitride films over the 974-1068 K temperature range revealed an activation energy of84kJmol–1. Film thicknesses and refractive indices were obtained usingin situreal-time ellipsometry, and the majority of the grown films displayed a refractive index of 2.0. Ellipsometric data for the growth of an 8 Å thermal-nitride film with a refractive index of 2.0 are also given.

Date: 1994
References: Add references at CitEc
Citations:

Downloads: (external link)
http://www.worldscientific.com/doi/abs/10.1142/S0218625X94000692
Access to full text is restricted to subscribers

Related works:
This item may be available elsewhere in EconPapers: Search for items with the same title.

Export reference: BibTeX RIS (EndNote, ProCite, RefMan) HTML/Text

Persistent link: https://EconPapers.repec.org/RePEc:wsi:srlxxx:v:01:y:1994:i:04:n:s0218625x94000692

Ordering information: This journal article can be ordered from

DOI: 10.1142/S0218625X94000692

Access Statistics for this article

Surface Review and Letters (SRL) is currently edited by S Y Tong

More articles in Surface Review and Letters (SRL) from World Scientific Publishing Co. Pte. Ltd.
Bibliographic data for series maintained by Tai Tone Lim ().