A COMPARATIVE STUDY OF THE SODIUM-PROMOTED OXIDATION AND NITRIDATION OFSi(100)-(2×1)USINGO2ANDN2MOLECULAR BEAMS
T.L. Bush,
T.S. Jones and
D.O. Hayward
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T.L. Bush: Department of Chemistry, Imperial College, South Kensington, London SW7 2AY, UK
T.S. Jones: Department of Chemistry, Imperial College, South Kensington, London SW7 2AY, UK
D.O. Hayward: Department of Chemistry, Imperial College, South Kensington, London SW7 2AY, UK
Surface Review and Letters (SRL), 1994, vol. 01, issue 04, 581-583
Abstract:
The interaction ofO2andN2molecular beams with a Na-coveredSi(100)-(2×1)surface has been studied as a function of incident beam energy and sodium coverage. Exposure toO2at 300 K results in the immediate dissociation of the molecules on impact with the surface leading to the direct formation of silicon oxide. In contrast, significant nitridation requires a further step involving desorption of the sodium. The rate of formation of the oxide or nitride increases uniformly with sodium coverage. In addition, the reaction probability for both processes is significantly enhanced by increasing the translational energy of the incidentO2orN2molecules. These observations indicate that both reactions proceed via a direct collisional activation process in which local electrostatic forces in the vicinity of the Na atoms are responsible for the promotional effect.
Date: 1994
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DOI: 10.1142/S0218625X94000710
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