IN SITUSTUDIES WITH LOW-ENERGY ELECTRON MICROSCOPY

Ruud M. Tromp
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Ruud M. Tromp: IBM Research Division, T.J. Watson Research Center, P.O. Box 218, Yorktown Heights, NY 10598, USA

Surface Review and Letters (SRL), 1995, vol. 02, issue 01, 103-107

Abstract: This paper gives a brief review of low-energy electron microscopy (LEEM) as used for in situ studies of surface dynamical processes. The capabilities of LEEM are illustrated with two examples. One is a kinetic instability observed during growth of the first layer ofCaF2onSi(111). The second concerns the nucleation of misfit dislocations during the growth of thicker, epitaxialCaF2films onSi(111), as the critical thickness is exceeded. Both examples highlight the importance of real time, in situ observations of surface dynamical processes.

Date: 1995
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DOI: 10.1142/S0218625X95000108

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