XPS STUDIES OF THE STABILITY OF A MIXED ZIRCONIUM OXIDE AND SULPHIDE THIN FILM

P.C. Wong, Y.S. Li, M.Y. Zhou and K.A.R. Mitchell
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P.C. Wong: Department of Chemistry, University of British Columbia, 2036 Main Mall, Vancouver, British Columbia, Canada V6T 1Z1, Canada
Y.S. Li: Department of Chemistry, University of British Columbia, 2036 Main Mall, Vancouver, British Columbia, Canada V6T 1Z1, Canada
M.Y. Zhou: Department of Chemistry, University of British Columbia, 2036 Main Mall, Vancouver, British Columbia, Canada V6T 1Z1, Canada
K.A.R. Mitchell: Department of Chemistry, University of British Columbia, 2036 Main Mall, Vancouver, British Columbia, Canada V6T 1Z1, Canada

Surface Review and Letters (SRL), 1995, vol. 02, issue 02, 165-169

Abstract: A 25 Å film formed by depositing zirconium(~2 Åmin–1)onto gold foil in the presence ofH2S(~5×10−8mbar)andH2O(~1×10−9mbar)has been studied by XPS. This film has an outer region composed of a mixed zirconium oxide/sulphide, while below there is metallic zirconium plusZr/Aualloy in contact with gold. This film appears stable on heating to 400°C under UHV insofar as the sulphide part does not change, although the oxide part increases apparently as a result of some reaction of metallic zirconium with ambient water. By contrast, when this preheated film at room temperature was treated with a hydrogen plasma, the sulphide component was completely removed and the whole film was converted to theZrO2-like form with enhanced formation of OH groups. The hydrogen plasma treatment is therefore capable of desulphurizing the mixed zirconium oxide/sulphide film.

Date: 1995
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DOI: 10.1142/S0218625X95000170

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