CHEMICAL RECONSTRUCTION OF THETiAl(010)SURFACE

C.P. Wang, S.K. Kim, F. Jona, D.R. Strongin, B.-R. Sheu and P.M. Marcus
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C.P. Wang: Department of Materials Science and Engineering, State University of New York, Stony Brook, NY 11794–2275, USA
S.K. Kim: Department of Materials Science and Engineering, State University of New York, Stony Brook, NY 11794–2275, USA
F. Jona: Department of Materials Science and Engineering, State University of New York, Stony Brook, NY 11794–2275, USA
D.R. Strongin: Department of Chemistry, State University of New York, Stony Brook, NY 11794–3400, USA
B.-R. Sheu: Department of Chemistry, State University of New York, Stony Brook, NY 11794–3400, USA
P.M. Marcus: Department of Materials Science and Engineering, State University of New York, Stony Brook, NY 11794–2275, USA

Surface Review and Letters (SRL), 1995, vol. 02, issue 02, 183-189

Abstract: The atomic structure of a clean (010) surface of the ordered binary alloyTiAl(with tetragonal bulk structure of theCuAuI type) is studied with quantitative low-energy electron diffraction (QLEED). Two different surface phases are found depending on the preparation procedure. After a cleaning stepin vacuoby means of Ar-ion bombardments, anneals at 750−850°C produce a2×1surface and anneals at about 900° C produce a1×1surface. A QLEED intensity analysis of the1×1structure reveals the occurrence of chemical reconstruction, whereby theTiatoms in the first layer exchange places with theAlatoms in the second layer. Thus, while any bulk (010) plane contains 50%Aland 50%Ti, the top atomic layer of a (010) surface contains 100%Aland the second atomic layer contains 100%Ti. Both layers are slightly buckled and the first interlayer distance is compressed about 7.1% while the second interlayer spacing is expanded about 7.4% with respect to the bulk value.

Date: 1995
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DOI: 10.1142/S0218625X95000200

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