STRUCTURAL AND MAGNETIC PROPERTIES OF EPITAXIALNi80Fe20THIN FILMS ONCu/Si

I. Hashim, H.S. Joo and H.A. Atwater
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I. Hashim: Thomas J. Watson Laboratory of Applied Physics, California Institute of Technology, Pasadena, CA 91125, USA
H.S. Joo: Thomas J. Watson Laboratory of Applied Physics, California Institute of Technology, Pasadena, CA 91125, USA
H.A. Atwater: Thomas J. Watson Laboratory of Applied Physics, California Institute of Technology, Pasadena, CA 91125, USA

Surface Review and Letters (SRL), 1995, vol. 02, issue 04, 427-437

Abstract: Single-crystal films of permalloy(Ni80Fe20)were grown onCu(001)seed layers oriented epitaxially withSi(001). The microstructural properties were measured usingin-situreflection high-energy electron diffraction, andex-situtransmission electron microscopy, x-ray diffraction, and atomic force microscopy, whereas the magnetic properties were probed usingin-situmagneto-optic Kerr effect andex-situvibrating sample magnetometry. Anisotropic magnetoresistance and resistivity for some of the samples were also measured. The coercivity for thinner (≤5 nm)Ni80Fe20was significantly higher (10–20 Oersteds) than polycrystalline films deposited onSiO2/Si, and was also higher than films deposited on lattice-matchedCuxNi1–xalloys. These magnetic properties were explained using a theoretical model involving interaction of domain walls with defects such as misfit dislocations and coherent islands, due to the mismatch betweenNi80Fe20andCu.

Date: 1995
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DOI: 10.1142/S0218625X95000388

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