Cu(111)SURFACE RELAXATION BY VLEED

I. Bartoš, P. Jaroš, A. Barbieri, M.A. van Hove, W.F. Chung, Q. Cai and M.S. Altman
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I. Bartoš: Institute of Physics, Academy of Sciences of the Czech Republic, Prague, Czech Republic
P. Jaroš: Institute of Physics, Academy of Sciences of the Czech Republic, Prague, Czech Republic
A. Barbieri: Materials Sciences Division, Lawrence Berkeley Laboratory, University of California, Berkeley, CA 94720, USA
M.A. van Hove: Materials Sciences Division, Lawrence Berkeley Laboratory, University of California, Berkeley, CA 94720, USA
W.F. Chung: Department of Physics, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong
Q. Cai: Department of Physics, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong
M.S. Altman: Department of Physics, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong

Surface Review and Letters (SRL), 1995, vol. 02, issue 04, 477-482

Abstract: Very-low-energy electron diffraction (VLEED) intensities from a cleanCu(111)surface have been measured in detail in the energy range 15–100 eV by low-energy electron microscope (LEEM). This enabled the elimination of possible disturbances due to stray magnetic fields. Corresponding theoreticalI–Vcurves have been obtained in good agreement with experimental data when an image-type surface barrier and anisotropy of the electron attenuation were taken into account. The reliability factor analysis indicates a slight expansion of the topmost interatomic spacing ofCu(111)relative to its bulk value.

Date: 1995
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DOI: 10.1142/S0218625X95000431

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