MAGNETORESISTANCES OF ULTRATHIN FINECu-PARTICLE ANDCuAu-PARTICLE FILMS

J.J. Lin and Shun-Ichi Kobayashi
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J.J. Lin: Department of Physics, Faculty of Science, University of Tokyo, 7–3–1 Hongo, Bunkyo-ku, Tokyo, Japan
Shun-Ichi Kobayashi: Department of Physics, Faculty of Science, University of Tokyo, 7–3–1 Hongo, Bunkyo-ku, Tokyo, Japan

Surface Review and Letters (SRL), 1996, vol. 03, issue 01, 97-102

Abstract: We have measured the magnetoresistances in ≈30-Å-thick fine Cu-particle and Au-doped Cu-particle (CuAu-particle) films between 2.1 and 4.2 K and in magnetic fields H up to 6 T, with sheet resistancesR□(4.2K)of the films ranging from ≈10 kΩ to 2 MΩ. We find that the magnetoresistances are positive, exhibiting broad maxima, at low H, while they can change sign and become negative at high H. The magnitudes of the normalized magnetoresistances,ΔR□(H)/R□(0)=[R□(H)−R□(0)]/R□(0), are of the order of a tenth of a percent, depending on the values ofR□. Particularly, the magnetoresistances in pure Cu-particle films are essentially isotropic, regardless of the orientation of H being applied parallel or perpendicular to the film plane. InCuAu-particle films, however, more negative perpendicular magnetoresistances relative to parallel magnetoresistances are observed. There observations are closely connected with the fine-particle structure of our films. Explanation for our experimental results in terms of current theories is presented.

Date: 1996
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DOI: 10.1142/S0218625X96000218

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