REACTIONS OF CARBON-SILICON BINARY CLUSTER IONS

Y. Negishi, N. Watanabe, H. Shiromaru, Y. Achiba and N. Kobayashi
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Y. Negishi: Department of Physics, Tokyo Metropolitan University, Hachioji, Tokyo 192–03, Japan
N. Watanabe: The Institute of Physical and Chemical Research (RIKEN), Wako, Saitama 351–01, Japan
H. Shiromaru: Department of Chemistry, Tokyo Metropolitan University, Hachioji, Tokyo 192–03, Japan
Y. Achiba: Department of Chemistry, Tokyo Metropolitan University, Hachioji, Tokyo 192–03, Japan
N. Kobayashi: Department of Physics, Tokyo Metropolitan University, Hachioji, Tokyo 192–03, Japan

Surface Review and Letters (SRL), 1996, vol. 03, issue 01, 661-665

Abstract: Ion-molecule reactions of silicon-carbon binary cluster ions${\rm{Si}}_n {\rm{C}}_m^+$(n=1–2, m=1–2)withO2molecules were studied by using an rf ion trap. The rate constants and branching ratios were determined for these cluster ions. For${\rm{SiC}}_2^+$, the rate constants for two isomers were obtained.

Date: 1996
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DOI: 10.1142/S0218625X96001182

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