SPUTTERING WITH GAS CLUSTER-ION BEAMS

J. Matsuo, M. Akizuki, J. Northby, G.H. Takaoka and I. Yamada
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J. Matsuo: Ion Beam Engineering Experimental Laboratory, Kyoto University, Sakyo, Kyoto 606, Japan
M. Akizuki: Ion Beam Engineering Experimental Laboratory, Kyoto University, Sakyo, Kyoto 606, Japan
J. Northby: Ion Beam Engineering Experimental Laboratory, Kyoto University, Sakyo, Kyoto 606, Japan
G.H. Takaoka: Ion Beam Engineering Experimental Laboratory, Kyoto University, Sakyo, Kyoto 606, Japan
I. Yamada: Ion Beam Engineering Experimental Laboratory, Kyoto University, Sakyo, Kyoto 606, Japan

Surface Review and Letters (SRL), 1996, vol. 03, issue 01, 1017-1021

Abstract: A high-current (~100 nA) cluster-ion-beam equipment with a new mass filter has been developed to study the energetic cluster-bombardment effects on solid surfaces. A dramatic reduction of Cu concentration on silicon surfaces has been achieved by 20-keV Ar cluster (N~3000) ion bombardment. The removal rate of Cu with cluster ions is two orders of magnitude higher than that with monomer ions. A significantly higher sputtering yield is expected for cluster-ion irradiation. An energetic cluster-ion beam is quite suitable for removal of metal.

Date: 1996
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DOI: 10.1142/S0218625X96001820

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