ELECTRON TRANSPORT PROPERTIES IN FINE-PARTICLE FILMS OF Au EVAPORATED ONTO Si NATIVE OXIDE: THERMAL ANNEALING EFFECTS

Hiroyuki Kasahara, T. Shikata and K. Yamamoto
Additional contact information
T. Shikata: Department of Electric & Electronics Engineering, Kobe University, Rokko, Nada, Kobe 657, Japan
K. Yamamoto: Department of Electric & Electronics Engineering, Kobe University, Rokko, Nada, Kobe 657, Japan

Surface Review and Letters (SRL), 1996, vol. 03, issue 01, 1133-1136

Abstract: We investigated electron transport in fine-particle films of Au prepared onto Si native oxide. Electron transport measurements and TEM observations were carried out for as-deposited and after thermal treatment of the films in air. We observed the anomalous resistance increases in as-deposited fine-particle films of Au and obtainedαT=4.5. After 150°C thermal treatment in air, however, these anomalous resistance increases in the Au films disappeared and its topography appeared on the TEM images drastically changed into percolative structure. We found that the size of the Au fine particles causes anomalous resistance increase at low temperature.

Date: 1996
References: Add references at CitEc
Citations:

Downloads: (external link)
http://www.worldscientific.com/doi/abs/10.1142/S0218625X96002023
Access to full text is restricted to subscribers

Related works:
This item may be available elsewhere in EconPapers: Search for items with the same title.

Export reference: BibTeX RIS (EndNote, ProCite, RefMan) HTML/Text

Persistent link: https://EconPapers.repec.org/RePEc:wsi:srlxxx:v:03:y:1996:i:01:n:s0218625x96002023

Ordering information: This journal article can be ordered from

DOI: 10.1142/S0218625X96002023

Access Statistics for this article

Surface Review and Letters (SRL) is currently edited by S Y Tong

More articles in Surface Review and Letters (SRL) from World Scientific Publishing Co. Pte. Ltd.
Bibliographic data for series maintained by Tai Tone Lim ().