THE ADSORPTION OF OXYGEN ON HongNiAl(001)AT 300 K AND 20 K

R. Franchy, S. K. So and P. GAßMANN
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R. Franchy: Institut für Grenzflächenforschung und Vakuumphysik des Forschungszentrums, Jülich 52425 Jülich, Germany
S. K. So: Department of Physics, Hong Kong Baptist College, Hong Kong, P. R. China
P. GAßMANN: Institut für Grenzflächenforschung und Vakuumphysik des Forschungszentrums, Jülich 52425 Jülich, Germany

Surface Review and Letters (SRL), 1996, vol. 03, issue 05n06, 1909-1917

Abstract: The adsorption of oxygen onNiAlat 300 K and 20 K has been studied by means of high resolution electron energy loss spectroscopy (EELS), low energy electron diffraction (LEED) and Auger electron spectroscopy (AES). The adsorption of oxygen at 300 K leads to formation of a thin film of amorphous aluminum oxide(a-Al2O3). After oxygen adsorption at 300 K and annealing of the oxygen-saturated surface to 1200 K, a well-ordered thinθ-Al2O3film is formed. After annealing of the oxygen-saturated surface to 1400 K, an α-likeAl2O3oxide is grown. Even at 20 K oxidation of theNiAl(001)surface is found. However, at higher exposure (≥ 5 L) oxygen physisorbs and the EEL spectrum exhibits characteristics of resonance scattering. The resonance energy for physisorbed oxygen on the amorphousAloxide layers formed at 20 K has a value of 7.0 eV. The frequency of O-O stretching vibration for physisorbed O2 is 193 meV. The line shape of this mode is asymmetric with a pronounced tail on the high energy side. The asymmetric line shape corresponds to multiple losses due to the overlap of the O-O stretching mode with low frequency modes. After physisorption of oxygen at 20 K on the α-likeAloxide layers, the resonance energy is shifted to 9.0 eV, a value close to that of oxygen in the gas phase.

Date: 1996
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DOI: 10.1142/S0218625X96002825

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